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In the semiconductor industry, a single wafer ion beam etching machine is a type of tool used to precisely print a semiconductor wafer’s surface. This device is utilised in the multi-step process of fabricating semiconductor devices, which produces sophisticated electronic components.
Ion beam etching is a method for etching patterns into a material’s surface by employing an ion beam to remove layers of the material. The ion beam is focused on a single wafer that is being held in place by a vacuum chuck in the case of a single wafer ion beam etching equipment. Magnetic lenses are used to focus the ion beam, which is commonly composed of argon or other noble gases.
In a variety of materials, including silicon, silicon dioxide, metal sheets, and more, patterns can be etched using an ion beam. A computer is generally used to operate the equipment, giving precise control over the etching procedure. By changing the ion beam’s energy, angle, and form, the etching process can be managed.
Single wafer ion beam etching machines are a crucial piece of equipment for the semiconductor industry because they can produce exact patterns on semiconductor wafers, which are used in the manufacturing of a variety of electronic devices, such as microprocessors, memory chips, and sensors.
Global Single Wafer Ion beam etching machine market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
A single wafer type ion beam etching system that processes materials finely with an ion beam and has an etched single wafer picked up from cassette to cassette is described on the Hitachi High-Tech website. The machine has options for filamentless wave neutralizer, end point detector mounting, and etching rate control. It also works with reactive gas.
A single wafer ICP RIE etch system for severe chemistries, the Oxford Instruments PlasmaPro 100 Polaris ICP RIE provides excellent etching speeds to keep your process window open.