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Anisotropic etching is a subtractive microfabrication method that tries to generate detailed and frequently flat forms by preferentially removing a material in certain orientations. Wet procedures use a structure’s crystalline characteristics to etch in crystallographically determined directions.
Ferric chloride, a reusable etchant that is safe to use, is used to etch the majority of metals. It is possible to regenerate and reuse ferric chloride. For specialty metals and alloys, other proprietary etchants, such as nitric acid, are employed.
Wet etching often destroys material isotopically, or uniformly in all directions. It can also be anisotropic, which means that material is removed in just one direction, as is required for designing circuits.
The Global Anisotropic etching chemicals market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
Anisotropic Etching of Pyramidal Silica Reliefs with Metal Masks and Hydrofluoric Acid. The development of anisotropic ally etched, faceted pyramidal pyramids in amorphous layers of silicon dioxide or glass. Silicon anisotropic and crystal-oriented etching is widely recognized.
Anisotropic etching behavior in totally amorphous layers of silicon dioxide using 100% isotropic hydrofluoric acid as etchant is an unexpected result. The practical applications of this innovative approach for self-perfecting pyramidal structures. It is suitable for textured silica or glass surfaces.
The existence of thin metal layers is the cause of the observed anisotropy, which leads to increased lateral etch rates.
A ratio of about 6-43 for liquid-based techniques and 59 for vapor-based methods separates the vertical etch rate of the non-metallized surface from the lateral etch rate underneath the metal.
Etchant concentration and a particular metal can be used to adjust the sidewall inclination, which is a ratio between lateral and vertical etch rate.
The method described makes it possible to directly fabricate shallow angle pyramids, which can, for instance, improve the coupling efficiency of light-emitting diodes or solar cells.
They can also be used to make specialized silicon dioxide atomic force microscope tips with a radius in the range of 50 nm, which have the potential to be used for surface plasmonic.
