By submitting this form, you are agreeing to the Terms of Use and Privacy Policy.
Arsine, also known as AsH3, is a colourless, lethal, flammable, compressed gas. Arsine is an n-type dopant for epitaxial silicon in semiconductor fabrication (often mixed with hydrogen).
It is used to dope specific regions of silicon wafer using deposition/diffusion techniques to form shallow structures like emitters or source drain contacts (typically high ppm to percentage mixtures with nitrogen) or to dope specific regions using ion implantation (often mixed with hydrogen) in various chemical reactions.
The Global Arsine market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
With the AsH3/C-1 and the AsH3/M-1, MEMBRAPOR offers two incredibly sensitive sensors that enable measurements of the exceedingly hazardous gas arsine in the ppb range.Arsine is today a typical technical product in the semiconductor sector, despite its historical use in chemical weapons.
In the context of thermal doping of silicon in the diffusion process and in ion implantation, arginine is utilised as a doping gas on a wide scale and in significant quantities. All processes must be managed and tracked with electrochemical aristolochic sensors in order to assure safety.
The lightest liquid hydrocarbon products frequently contain concentrations of low boiling impurities such arsine (AsH3). A specifically created absorbent that is selective for the removal of arsine from natural gas streams is part of the PURASPECTM product line. PURASPEC material has been successfully used in the field to remove arsine from natural gas streams.
The PURASPEC line of catalysts and chemical absorbents from Johnson Matthey is intended to remove impurities to very low levels in a variety of applications in the gas processing, refinery, and petrochemical industries.
