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A wet etchant used in microfabrication is buffered hydrogen fluoride(BHF), sometimes referred to as HF or buffered oxide etch (BOE). Its main application is for etching silicon dioxide (SiO2) or silicon nitride thin films (Si3N4).
It is a combination of hydrofluoric acid and buffering agents such as ammonium fluoride (NH4F) (HF). Concentrated HF (usually 49% HF in water) peels photoresist used in lithographic patterning and etches silicon dioxide too quickly for accurate process control.
To achieve more controllable etching, people frequently utilise a buffered oxide etch.In HF solutions, several oxides result in insoluble byproducts.
In order to dissolve these insoluble compounds and create a higher-quality etch, HCl is frequently added to BHF solutions.
The Global Buffered Hydrogen Fluoride market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
The hydrofluoric acid content of a buffered oxide etching composition is to be determined using methods and compositions according to the invention.
Because hydrofluoric acid has variable equilibriums and is toxic, it is challenging to handle and analyse, making it particularly challenging to determine the amount present in buffered oxide etching compositions.
However, using the wrong amount of hydrofluoric acid when making microchips will damage those chips.
In order to acquire precise measurements that are immediate, safe, and accurate, the invention uses a novel way of spectrographically detecting the hydrofluoric acid when it comes into contact with additional chromogenic substances.
The process may involve anticipating the expected etch rate of a particular BOE composition based on the interaction of temperature, surfactant type, surfactant concentration, HF concentration, composition flow rate, composition flow direction, and proximity of the application location of the BOE composition to the location of a layer-layer interface on a wafer.
Applying the BOE composition on the wafer may cause etching. A chromogenic agent may be used in a SIA procedure to measure the HF concentration concurrent with etching.
A reputable firm with a focus on creating a broad range of chemicals for different industries is called Transene Co. Hydrogen fluoride, which has several uses, is one of their standout products.
The brand name for hydrogen fluoride produced by Transene Co. is “Transene HF.” Transene Co. developed and produced this specialized hydrogen fluoride formulation to satisfy their customers’ particular needs and specifications.
Transene HF is a premium hydrogen fluoride product that goes through stringent quality control procedures to guarantee its effectiveness and purity. It is well known for its dependability and efficiency in a variety of applications, including as etching, cleaning, and surface treatment in the semiconductor, electronics, and chemical industries.
Transene Co. takes pleasure in the creation and manufacturing of Transene HF, using exacting manufacturing procedures and cutting-edge technology to produce a great product. They are able to produce a hydrogen fluoride formulation that satisfies the highest industry standards thanks to their proficiency in chemical engineering and significant research and development.
Transene HF comes in a variety of forms to meet the needs of various applications. These consist of: The most popular form of transene HF is delivered as a concentrated liquid solution and is called transene HF liquid. It is frequently utilized in wet etching procedures, which involve applying liquid to a substrate in order to remove certain material layers. Hydrogen fluoride is also available from Transene Co.
in vapor form, which is ideal for a few unique applications. The vapor form is frequently employed in the production of microelectronic devices because it enables perfect control over the etching procedure.
Outstanding purity and stability are two qualities that define transene HF. Low impurity levels and reliable performance are ensured by the product’s thorough manufacturing process. Each batch of Transene HF is rigorously tested and analyzed as part of Transene Co.’s quality control processes to ensure that it fulfills the required criteria.
According to industry standards and safety recommendations, Transene HF is packaged and labeled. The product is shielded from contamination and handled safely thanks to the packaging.
To help people utilize the product safely and effectively, the labels include crucial information such as handling directions, safety considerations, and storage suggestions.
The remarkable etching properties of transene HF are well known. In the production of semiconductors and microelectronics, it is frequently used to remove various compounds selectively, including metal films, silicon dioxide, and silicon nitride.
Transene Co. also places a high priority on offering top-notch customer service. They have a staff of professionals on hand to help customers with any questions or technical problems they could run across. Additionally, Transene Co.
supplies thorough documentation, such as technical datasheets and material safety data sheets (MSDS), to give clients all the details they require regarding Transene HF. Hydrogen fluoride is produced and sold by Transene Co.
under the trade name “Transene HF.” This high-quality item is well-known for its dependability and performance and is utilized extensively across several sectors.
Transene HF is a dependable option for individuals in need of hydrogen fluoride solutions thanks to Transene Co.’s dedication to excellence, cutting-edge manufacturing techniques, and commitment to client satisfaction.
