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Using liquid chemicals, reaction gases, or chemical reactions involving ions, an etch system molds the thin film into the desired patterns.
Manufacturing lines for semiconductors and other electronic devices employ an etch system.
Using a photo-resist mask, chemical etching is a metal processing technique that yields flat, stress-free components.
It is particularly well adapted to the production of aesthetic parts like car interior trim as well as precision parts like grids and meshes, lead frames, bipolar fuel cell and plate heat exchangers, precision springs, washers, and gaskets.
By heating the solution and spraying under high pressure, an etching machine accelerates the corrosion reaction between the chemical and the substance.
The chemical spray dissolves the exposed metal, etching the material atom by atom to provide a polish devoid of burrs.
The Global gas chemical etch system market accounted for $XX Billion in 2021 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2022 to 2030.
For 300mm wafers, Certas LEAGA is a high-throughput, environmentally friendly gas chemical etch technology that offers surface etching and cleaning without the use of liquids.
Watermark-free, superior selectivity performance over diverse SiO2 films, and accurate interface cleaning control are all aspects of its dry processing. When used in conjunction with TEL’s cleaning system, it offers more versatility.
Through its plasma-free solution, Certas LEAGA satisfies a number of isotropic process requirements for 3D-structure devices with high utilization capability and low cost operation.
To meet different process needs, up to six dual-wafer processing chambers can be mounted on a single platform. process units that are simple to configure, allowing for device growth and increased efficiency.
It offers incredibly precise process options like surface pre-cleaning for Si contact formation, oxide film removal and etch back, selective etch in high-aspect 3D structure, and precise recess process, and has been widely embraced by international semiconductor manufacturers from volume manufacturing to next-generation development.
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