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Lithography is a planographic printing process that uses a plate or stone with a flat surface. In Greek, “lithos” means stone, and “graphein” means to write.
The process of creating one- and two-dimensional structures with at least one lateral dimension in the nanoscale range is referred to as lithography.
Positive and negative masks are used in lithography to duplicate designs onto supporting substrates.
Along with measuring and correction techniques for glass-plate surface aberrations, lithography technologies have been developed that enable high-definition patterning of a sizable area with a single exposure.
The Global lithography-grade lens market accounted for $XX Billion in 2021 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2022 to 2030.
Nikon Corporation (Nikon) announced the release of the new FPD lithography system FX-6AS which supports small and medium-sized panels.
The FX-6AS is an optimal FPD lithography system for manufacturing high-definition organic light-emitting diode panels and LCD panels for the latest high-definition mobile devices, such as smartphones.
With the newly developed projection lens, the FX-6AS enables the highest level of resolution, high alignment accuracy, and high throughput.
Launch of the FPA-5510iV semiconductor lithography tool by Canon U.S.A., Inc. for advanced semiconductor packaging. For high-productivity performance, the FPA-5510iV has a large exposure area and high-intensity exposure.
The 10iV’s New Projection Lens offers the best Numerical Aperture (NA)*3 conditions for TSV and bump processes, which need huge aspect ratios and resolutions between 1 and 50 microns.
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