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A narrow probe electrode is placed in touch with or very near the surface of a sample during scanning capacitance microscopy (SCM), a type of scanning probe microscopy. SCM characterises the surface of the sample using information derived from the change in electrostatic capacitance between the surface and the probe.
If a native oxide is present, SCM applied to semiconductors uses an ultra-sharp conducting probe to create a metal-insulator-semiconductor (MIS/MOS) capacitor with a semiconductor sample.
Typically, this probe has a Pt/Ir or Co/Cr thin film metal coating applied to an etched silicon probe. A bias applied between the tip and sample with the probe and surface in touch will cause variations in capacitance between the tip and sample.
The Global Scanning Capacitance Microscopy (SCM) Market accounted for $XX Billion in 2022 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2023 to 2030.
QuickStep SCM, the most recent technology for scanning capacitance microscopy with high productivity, has been launched by Park Systems.
(SCM). Designed to work with Park NX AFM series, the leading AFM products for researchers and engineers in the semiconductor industry, Park’s QuickStep SCM provides accurate dopant profiles of semiconductor device structures, 5 to 10 times faster than any other competing SCM atomic force microscopy systems.
The scanning capacitance microscopy from Park has excellent features to ensure the best outcomes and is built to provide an unmatched signal-to-noise ratio.
Contrary to other methods, their new SCM module can differentiate between doping concentrations of less than an order of magnitude with ease.Additionally, Park’s QuickStep SCM is engineered to offer the fastest scan speed without sacrificing signal sensitivity, spatial precision, or data accuracy.
Scanner capacitance microscopy (SCM) offers the one-of-a-kind capability to detect quantitative 2D dopant profiles for device characterization.
The ability to describe the dopant profile in semiconductor manufacturing is a crucial component in determining failure causes and advancing design, which is why Park created the new SCM feature.
Their design team has produced an SCM that outperforms any on the market, dramatically increasing the throughput of the SCM measurement by as much as ten times while keeping high signal sensitivity, spatial resolution, and data accuracy.
