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A quantitative spectroscopic method based on the photoelectric effect called X-ray photoelectron spectroscopy can identify the elements present in a material or covering its surface as well as their chemical states, as well as the material’s overall electronic structure and density of electronic states.
Because it reveals both the elements that are present and the other elements to which they are linked, XPS is a strong measurement technique. The method can be applied to depth profiling when combined with ion-beam etching or to line profiling of the elemental composition throughout the surface.
It is frequently used to examine chemical reactions in materials in their natural condition as well as those that have undergone cleavage, scraping, heating, exposure to reactive gases or solutions, ultraviolet radiation, or ion implantation. XPS is a type of photoemission spectroscopy in which an X-ray beam is used to irradiate a material in order to produce electron population spectra.
By measuring the kinetic energy and the quantity of expelled electrons, chemical states can be deduced. XPS requires high vacuum or ultra-high vacuum settings, while ambient-pressure XPS, in which materials are evaluated at pressures of a few tens of millibar, is now under development.
Apart for hydrogen and helium, all elements are easily detected by XPS when using laboratory X-ray sources. The detection limit is in the parts per thousand range, however long collecting durations and concentration at the top surface can yield parts per million.
The Global XPS analyzer Market accounted for $XX Billion in 2022 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
Newest XPS System launched by ULVAC-PHI goes on sale, dramatically speeding up battery research and development. The “PHI GENESIS” XPS is a new product that combines the fundamental “GENE” of the PHI surface analysis instruments with expandability and gives overwhelming basic performance in a small chassis.
These instruments have a 50-year history of advanced automation and shortened analysis times. The “PHI GENESIS” XPS offers astounding micro XPS analysis performance that is high-speed, high-sensitive, and multi-sample analysis with automated sample exchange. High performance also benefits from an analyzer with improved counting rate and great sensitivity.
Up to this point, ULVAC-PHI and Physical Electronics USA, a division of ULVAC-PHI, have created a number of XPS analysis technologies that are firsts in the world.
These technologies include scanning micro XPS and HAXPES, fully automated robotics XPS analysis, full-automatic insulator neutralisation analysis, and depth profiling of organic materials using cluster etching ion gun.
