GLOBAL 12-CHAMBER PLASMA ETCH SYSTEM MARKET

INTRODUCTION

 Plasma etching is the process of removing material from a surface using a plasma source. In order to treat a sample, a suitable plasma gas mixture must be pulsed at the sample. There are two types of plasma sources: charged (ions) and neutral (etch species) (atoms and radicals).

The use of plasma to etch or remove material from a polymer substrate, oxide, metal, glass, or ceramic is known as a plasma etcher. It is possible to clean, etch, and deposit compounds on surfaces using the highly ionised gas known as plasma.

Chemical etching is the process of removing material from a substrate with chemicals. The use of plasma to etch or remove material from a polymer substrate, oxide, metal, glass, or ceramic is known as a plasma etcher. It is possible to clean, etch, and deposit compounds on surfaces using the highly ionised gas known as plasma. Chemical etching is the process of removing material from a substrate with chemicals.

GLOBAL 12-CHAMBER PLASMA ETCH SYSTEM MARKET SIZE AND FORECAST

 The global 12-chamber plasma etch system market accounted for $XX Billion in 2022 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2023 to 2030.

 NEW PRODUCT LAUNCH

The Episode UL series of etch systems was introduced and allows for flexible configuration with up to 12 chambers. EpisodeTM UL dramatically increases clients' fab production thanks to footprint savings, ease of maintenance, and TEL's unique smart tool technology. Its high productivity and outstanding process performance assist semiconductor devices' expanding range of applications and hasten their growth.

Episode UL was created to increase the productivity of TEL clients' fabs. It has a number of benefits, such as variable multi-chamber configurations, considerable footprint savings, ease of maintenance, and cutting-edge Smart tool features.

The first rectangular cluster system with processing chambers arranged in two rows that are horizontally opposed was created by TEL. Depending on the fab layouts of the customer, Episode UL may flexibly accommodate between 4 and 12 chambers to maximise loading capacity.

The new platform's horizontally opposed cluster design delivers a considerable reduction in footprint per chamber for both cleanroom and utility areas, with a maximum 12 chamber configuration. Additionally, EpisodeTM UL is easier to maintain than its predecessors because to a wider room for maintenance.

A multitude of sensors and high-speed control systems are included into its transfer system and process modules, enabling autonomous process control using big data analytics and TEL's in-house smart tool technology.

 COMPANY PROFILE

• Autoquip Inc
• Shark Cave Systems
• Genist Technocracy Pvt. Ltd.
• Pernix Bio-Tech
• Map Industries
  

THIS REPORT WILL ANSWER FOLLOWING QUESTIONS

1. How many 12-chamber plasma etch systems are manufactured per annum globally? Who are the sub-component suppliers in different regions?
2. Cost breakup of a Global 12-chamber plasma etch system and key vendor selection criteria
3. Where is the 12-chamber plasma etch system manufactured? What is the average margin per unit?
4. Market share of Global 12-chamber plasma etch system market manufacturers and their upcoming products
5. Cost advantage for OEMs who manufacture Global 12-chamber plasma etch system in-house
6. key predictions for next 5 years in Global 12-chamber plasma etch system market
7. Average B-2-B 12-chamber plasma etch system market price in all segments
8. Latest trends in 12-chamber plasma etch system market, by every market segment
9. The market size (both volume and value) of the 12-chamber plasma etch system market in 2023-2030 and every year in between?
10. Production breakup of 12-chamber plasma etch system market, by suppliers and their OEM relationship