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The ability to manipulate matter on a nanoscale is one of the cornerstones of nanotechnology. Scanning Probe Microscopy (SPM) plays a key role in this foundational pillar because it allows for both surface viewing and sub-molecular material manipulation.
Numerous papers in the literature demonstrate astounding instances of high resolution imaging and manipulation done using various SPM techniques. Due to its simplicity and suitability for a wide range of materials, anodic oxidation lithography (AOL) stands out as one of the most promising technologies in these instances.
The process of material alteration (oxidation) using a strong electric field applied between the scanning tip and the sample surface can be summed up in one sentence as SPM-based AOL Electrons typically flow from tip to sample since the SPM tip is normally negatively biassed in relation to the sample.
Sample oxidation is made possible by the water contaminated layer acting as an electrochemical medium on both the tip and the sample surface. As a result, it is crucial to AOL that important factors including applied bias, biassing time, and ambient humidity are under control. In other words, a thorough analysis of these factors is required before applying AOL to any system.
The Global Anodic oxidation lithography Market accounted for $XX Billion in 2022 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2023 to 2030.
A reliable and versatile nanolithography technique for a variety of applications is provided by scanning probe lithography based on local anodic oxidation lithography (LAO).
However, the need for a prefabricated microelectrode to carry the driving electrical current has severely limited its practical application. a novel electrode-free anodic oxidation lithography approach that allows for very accurate and flexible in situ patterning of low-dimensional materials and heterostructures that have already been manufactured.
The electrode-free anodic oxidation lithography , which differs from typical anodic oxidation lithography driven by a direct current in that it uses capacitive coupling instead of a contacting electrode, is driven by a high-frequency (>10 kHz) alternating current, which can even be used to customise insulating materials. We showed flexible nanolithography of graphene, hexagonal boron nitride, and carbon nanotubes on insulating substrates with an accuracy of 10 nanometers using this method.
Furthermore, the electrode-free anodic oxidation lithography demonstrates excellent etching quality with no oxide residues behind. The fabrication of ultraclean nanoscale devices and heterostructures with high flexibility is made possible by an in situ, electrode-free nanolithography with high etching quality.
