ArF IMMERSION SCANNER MARKET

INTRODUCTION

The market-leading ArF immersion scanner uses the well-known Streamlign platform and the most recent advancements in lens, autofocus, alignment, and defectivity minimization technologies to provide unmatched multiple patterning performance and productivity.

For patterning crucial layers during the fabrication of integrated circuits (ICs) and for multi-patterning applications that support the most cutting-edge semiconductor production nodes in the world, ArF (argon fluoride) immersion light sources have a 193 nm wavelength.

It is compatible with complex computational and on-product learning software solutions and connected with the industry-leading inline Alignment Station (iAS). These components work together to guarantee top-notch device patterning and maximum fab productivity to completely meet 5 nm node needs and beyond.

Uses a reticle stage with an encoder servo system to boost precision along with the well-known Bird's Eye Control technology to precisely determine wafer location.

Additionally, improvements to the scanner's stage controller and metrology system enable higher overlay accuracy, and improved component materials and temperature management capabilities assure exceptional tool overlay stability even in the harshest production environments.

ArF IMMERSION SCANNER MARKET SIZE AND FORECAST

Global ArF immersion scanner market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.

ArF IMMERSION SCANNER MARKETNEW PRODUCT LAUNCH

The NSR-S631E is the newest generation Nikon ArF immersion scanner from Nikon Corporation.This lithography equipment was created for use in high-volume semiconductor production using 7-nm node techniques. It has the high precision and outstanding productivity of the tried-and-true and it allows multiple patterning.

Today's cutting-edge semiconductors are shifting to 10-nm node techniques for high-volume production, while 7-nm node methods are being used for development.

Photolithography technologies continue to rely on multiple patterning technology with ArF immersion exposure systems to further miniaturise circuit patterns. Improved overlay productivity and accuracy are crucial for these exposure systems.

Through the employment of a novel projection lens and enhanced alignment system mark detection and measurement, the NSR-S631E achieves a mix-and-match overlay (MMO) of 2.3 nm or less. With throughput capacities of up to 270 (96-shot) wafers per hour, the S631E also maximises fab productivity.

ArF IMMERSION SCANNER MARKETCOMPANY PROFILE

• Nikon
• ASML
• Photonics
• Gigaphoton
• DRAM

THIS REPORT WILL ANSWER FOLLOWING QUESTIONS

1. How many ArF immersion scanners are manufactured per annum globally? Who are the sub-component suppliers in different regions?
2. Cost breakup of a Global ArF immersion scanner and key vendor selection criteria
3. Where is the ArF immersion scanner manufactured? What is the average margin per unit?
4. Market share of Global ArF immersion scanner market manufacturers and their upcoming products
5. Cost advantage for OEMs who manufacture Global ArF immersion scanner in-house
6. key predictions for next 5 years in Global ArF immersion scanner market
7. Average B-2-B ArF immersion scanner market price in all segments
8. Latest trends in ArF immersion scanner market, by every market segment
9. The market size (both volume and value) of the ArF immersion scanner market in 2024-2030 and every year in between?
10. Production breakup of ArF immersion scanner market, by suppliers and their OEM relationship