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One millisecond of heating time is possible with flash lamp annealing.In contrast to conventional heat sources, UV to visible wavelength light emitted from the flash lamp can concentrate heat on a substrate (material) surface. As a result, the thermal influence on the underlying film or substrate can be very minimal.
The zero diffusion of semiconductor implanted layers and thermal budget reduction are two upcoming device breakthroughs that will depend heavily on this millisecond surface heat treatment method. Additionally, flash lamp heating is utilized to create reactions like curing, bonding, peeling, breakdown, and crystallization.
These traits are successfully used in numerous R&D applications, including those involving SiC wafers, glass, plastic films, and other flexible substrates, as well as those involving production lines. A flash lamp is any of a number of tools that emit quick, bright light emissions that are useful for photography and for observing moving objects.
Flash annealing restricts heat treatment to the top layer, stopping contaminants from diffusing into the material and enabling the creation of incredibly thin semiconductor layers. Silicon that has been vapor-deposited onto the substrate is polycrystallized via heat treatment.
The Global Flash Lamp Annealer market accounted for $XX Billion in 2022 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2023 to 2030.
Iinuma has launched The Flash Lamp Annealer, layer and surface properties of large-area substrates are frequently improved by thermal treatment of coated glass, polymers, and wafers. The entire substrate is heated during typical furnace-annealing techniques, and it must gradually cool down thereafter.
For addressing large substrate areas, this might be challenging because it requires a lot of time and energy. Long thermal procedures for thin-film technology also result in unwanted diffusion phenomena, which may need the installation of extra barrier layers that suppress diffusion.
As a result, the production process gets more complicated. For the improvement of film characteristics, such as electrical and optical properties, flash lamp annealing (FLA) presents a good substitute for traditional furnace annealing, particularly on large-area substrates.
