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The process of growing thin films of materials with exact control over their thickness, content, and crystal structure is known as molecular beam epitaxy (MBE). To carry out this operation, a very specialized piece of machinery called an MBE machine is employed.
The growing process occurs in a vacuum chamber that is part of the MBE machine. A number of pumps are installed within the chamber, which is normally composed of stainless steel, to generate a high vacuum atmosphere. To get rid of any impurities that can obstruct the growing process, the Hoover is required.
There are various sources of atoms or molecules inside the chamber that are employed to grow the thin films. These sources, which can be constructed from a variety of materials, are heated to produce a beam of atoms or molecules that is focused on the substrate. The substrate is usually positioned in the beam’s path and is made of semiconductor material, such as silicon.
The atoms or molecules from the sources condense as soon as they contact the substrate, forming a thin film that builds up layers at a time. In order to produce the necessary film qualities, the process is meticulously regulated and monitored, with the substrate temperature, source flux, and other parameters being carefully adjusted.
Many different types of electronic and optical devices, such as semiconductors, solar cells, and lasers, are made using MBE.
The Global Molecular Beam Epitaxy (MBE) Machine Market accounted for $XX Billion in 2022 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2023 to 2030.
The first MBE 8000 system, the largest MBE machine in the world, has been delivered to IntelliEPI, a longtime client of RIBER, a global market leader for molecular beam epitaxy (MBE) equipment for the semiconductor industry. This delivery is a component of a sales agreement for the machinery to be utilized in producing epi wafers for ultra-high performance applications involving vertical cavity surface emitting lasers (VCSEL).
VCSEL-based devices can be manufactured into devices with high-density arrays of emitters since they emit via the substrate surface. As the standard technology for an expanding range of applications, such as 3D identification (facial recognition on smartphones) or movement control, these components are increasingly displacing conventional lasers in a variety of industries, including consumer electronics, healthcare, automotive, and telecoms.
The MBE technique from RIBER has a number of advantages over other technologies. The quality of the deposited semiconductor films is improved, the conductivity properties are improved, and the laser performance is strengthened as a result of the ability to make highly abrupt interfaces paired with extremely precise dose control. RIBER has created the new MBE 8000 production system to meet the demand for a higher production throughput MBE platform for high-performance epi wafer fabrication with exceptional wafer uniformity.
The ultra-high vacuum deposition method is used by the fully automated MBE 8000. This device, a multi-wafer reactor, can develop up to eight 150 mm wafers at once and has the ability to switch to 200 mm wafers in the future.
