GLOBAL PATTERNED WAFER INSPECTION SYSTEM MARKET 

INTRODUCTION

 Patterned wafer inspection system can therefore detect defects by comparing the pattern images of adjacent chips (also called dies) and obtaining the difference. The pattern on the wafer is captured along the die array by electron beam or light.

patterned silicon wafer is produced using a process called photolithography. A puddle is a shaped silicon puddle. This puddle is etched using a chemical called a chemical etching solution.

It is made by removing a layer of crystalline silicon. In this way, the amorphous puddle is a patterned sludge.The progression to ever smaller wafer feature sizes produces lower and lower tolerance to defects in both starting materials and finished devices.

Not only are we approaching near zero tolerances to known defect types (particles, crystal defects, etc.), but manufacturers continue to discover device sensitivities to entirely new types of defects as manufacturing progresses into the deep nano-scale.

GLOBAL PATTERNED WAFER INSPECTION SYSTEM MARKET SIZE AND FORECAST

Global patterned wafer inspection system market accounted for $XX Billion in 2022 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2023 to 2030.

NEW PRODUCT LAUNCH

Hitachi High-Tech Launches Dark Field Wafer Defect Inspection System DI2800, Achieving High-Sensitivity 100% Inspection for Semiconductor Devices in the IoT and Automotive Fields.

Hitachi High-Tech Corporation ("Hitachi High-Tech") today announced the launch of the Hitachi Dark Field Wafer Defect Inspection System DI2800, a critical component in any semiconductor manufacturer’s metrology capabilities.

The DI2800 is a high-speed metrology system designed to identify defects and particles on patterned wafers up to 8 inches (200 mm) in diameter.

With its high throughput and performance, the DI2800 can help ensure device reliability and safety, particularly for highly sensitive applications such as Internet of Things (IoT) and automotive fields where 100% inspection is required.

Hitachi High-Tech has developed Dark Field Wafer Defect Inspection System DI2800 to respond to these market needs.

This product uses scattering-intensity simulation technology to optimize the illumination and detection optics, enabling highly sensitive inspection of patterned-wafer defects developed during the manufacturing process. It has a detection sensitivity of 0.1-μm standard particle size on mirrored wafers.

This performance is even possible on devices as small as 0.3-mm square, which has previously proved challenging due to sensitivity and data processing limitations. With a highly optimised inspection sequence, the DI2800 is capable of throughputs of over 40 200-mm wafers per hour

COMPANY PROFILE

• Hitachi
• Chroma
• Olympus
• KLA
• Nikon

THIS REPORT WILL ANSWER FOLLOWING QUESTIONS

1. How many patterned wafer inspection systems are manufactured per annum globally? Who are the sub-component suppliers in different regions?
2. Cost breakup of a Global patterned wafer inspection system and key vendor selection criteria
3. Where is the patterned wafer inspection system manufactured? What is the average margin per unit?
4. Market share of Global patterned wafer inspection system market manufacturers and their upcoming products
5. Cost advantage for OEMs who manufacture Global patterned wafer inspection system in-house
6. key predictions for next 5 years in Global patterned wafer inspection system market
7. Average B-2-B patterned wafer inspection system market price in all segments
8. Latest trends in patterned wafer inspection system market, by every market segment
9. The market size (both volume and value) of the patterned wafer inspection system market in 2023-2030 and every year in between?
10. Production breakup of patterned wafer inspection system market, by suppliers and their OEM relationship