Global PECVD Thin Film Deposition Equipment Size and Forecasts 2030
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Global PECVD Thin Film Deposition Equipment Size and Forecasts 2030

Last Updated:  Apr 25, 2025 | Study Period:

PECVD THIN FILM  DEPOSITION EQUIPMENT

 

INTRODUCTION

A thin layer of material is deposited onto a substrate using the PECVD (Plasma-Enhanced Chemical Vapor Deposition) thin film deposition process. In the semiconductor industry, thin coatings of silicon dioxide (SiO2), silicon nitride (Si3N4), and other materials are frequently applied to silicon wafers via PECVD.

 

 A thin layer of material is deposited onto a substrate using the PECVD (Plasma-Enhanced Chemical Vapor Deposition) thin film deposition process. In the semiconductor industry, thin coatings of silicon dioxide (SiO2), silicon nitride (Si3N4), and other materials are frequently applied to silicon wafers via PECVD.

 

A vacuum chamber, a gas delivery system, a plasma source, and a substrate holder make up the majority of PECVD equipment. Low pressure is produced in the vacuum chamber, which is essential for the deposition procedure.

 

The precursor gases are put into the vacuum chamber using the gas delivery system. The plasma, which is required for the deposition procedure, is produced by the plasma source. It uses the substrate holder.

 

Precursor gases are injected into the vacuum chamber during the PECVD process, and a plasma is produced using an RF (Radio Frequency) source. The precursor gases are broken down by the plasma, which causes them to react and deposit a thin film onto the substrate.

 

A wide range of thin films, including dielectrics, semiconductors, and metals, can be deposited using PECVD apparatus. The PECVD process is incredibly adaptable and provides exceptional control over film characteristics like thickness, composition, and uniformity.

 

The semiconductor industry use PECVD equipment extensively for the production of integrated circuits and other electronic devices.

 

PECVD THIN FILM DEPOSITION EQUIPMENT SIZE AND FORECAST

 

PECVD Thin Film Deposition Equipment Size

 

Global PECVD Thin Film  deposition Equipment market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.

 

PECVD THIN FILM DEPOSITION EQUIPMENT MARKET NEW PRODUCT LAUNCH

A cutting-edge PECVD200 system from CVD Equipment Corporation has been introduced as the company's new cluster tool product platform. For higher output overall, the programmable cluster tool platform may support up to three PECVD process modules that deposit carbon-based materials onto 200mm wafers.

 

The process module includes improvements in temperature stabilization and multi-zone heating for the best deposition. To facilitate the development of 5G Wireless technology, this method will be utilized to produce discrete semiconductor devices on 200 mm wafers[1].

 

Additionally, ACM Research has introduced a brand-new PECVD instrument, giving them even another chance to enhance their chemical vapor deposition skills.

 

The ULTRA Pmax TM PECVD tool has a custom-designed gas distribution unit, chuck, and chamber that are meant to optimize particle performance, minimize film stress, and improve film uniformity[2].

 

When compared to conventional deposition, which occurs at temperatures between 700 and 950 degrees Celsius, VTC-PECVD is a plasma-enhanced chemical vapor deposition (PECVD) system with a high vacuum chamber.

 

PECVD THIN FILM DEPOSITION EQUIPMENT MARKET COMPANY PROFILE 

  • MSPTS Technologies Ltd
  • Plasma-Therm LLC
  • Oxford Instruments plc
  • Lam Research Corporation
  • Applied Materials, Inc
  • ASM International NV.
  • Canon Anelva Corporation

 

THIS PECVD THIN FILM DEPOSITION EQUIPMENT MARKET REPORT WILL ANSWER FOLLOWING QUESTIONS

  1. How many PECVD Thin Film  deposition Equipment are manufactured per annum globally? Who are the sub-component suppliers in different regions?
  2. Cost breakup of a Global PECVD Thin Film  deposition Equipment and key vendor selection criteria
  3. Where is the PECVD Thin Film  deposition Equipment manufactured? What is the average margin per unit?
  4. Market share of Global PECVD Thin Film  deposition Equipment market manufacturers and their upcoming products
  5. Cost advantage for OEMs who manufacture Global PECVD Thin Film  deposition Equipment in-house
  6. key predictions for next 5 years in Global PECVD Thin Film  deposition Equipment market
  7. Average B-2-B PECVD Thin Film  deposition Equipment market price in all segments
  8. Latest trends in PECVD Thin Film  deposition Equipment market, by every market segment
  9. The market size (both volume and value) of the PECVD Thin Film  deposition Equipment market in 2024-2030 and every year in between?
  10. Production breakup of PECVD Thin Film  deposition Equipment market, by suppliers and their OEM relationship

 

Sl noTopic
1Market Segmentation
2Scope of the report
3Abbreviations
4Research Methodology
5Executive Summary
6Introduction
7Insights from Industry stakeholders
8Cost breakdown of Product by sub-components and average profit margin
9Disruptive innovation in the Industry
10Technology trends in the Industry
11Consumer trends in the industry
12Recent Production Milestones
13Component Manufacturing in US, EU and China
14COVID-19 impact on overall market
15COVID-19 impact on Production of components
16COVID-19 impact on Point of sale
17Market Segmentation, Dynamics and Forecast by Geography, 2024-2030
18Market Segmentation, Dynamics and Forecast by Product Type, 2024-2030
19Market Segmentation, Dynamics and Forecast by Application, 2024-2030
20Market Segmentation, Dynamics and Forecast by End use, 2024-2030
21Product installation rate by OEM, 2023
22Incline/Decline in Average B-2-B selling price in past 5 years
23Competition from substitute products
24Gross margin and average profitability of suppliers
25New product development in past 12 months
26M&A in past 12 months
27Growth strategy of leading players
28Market share of vendors, 2023
29Company Profiles
30Unmet needs and opportunity for new suppliers
31Conclusion
32Appendix