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These systems frequently carry out highly repeatable tasks needing high degrees of precision. For oxide and nitride depositions, single-wafer PECVD systems are more frequently used, but batch systems are also available.
Deposition is a fabrication method whereby materials are applied to a wafer in thin sheets. A microsystem is created by depositing many layers of various materials. Every material and layer has a specific purpose.
A wafer, also known as a slice or substrate, is a thin semiconductor slice used in electronics to make solar cells and integrated circuits. It is often made of crystalline silicon (c-Si). Microelectronic devices are constructed in and upon the wafer, which acts as the substrate for those devices.
Deposition is a technique that covers a surface with a layer of materials. Selective deposition, atomic-layer deposition, chemical vapour deposition, and physical vapour deposition are a few methods that can be used to accomplish this.
The global Single Wafer Deposition System market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
Tokyo Electron (TEL) announced today that the Triase+EX-II Pro single-wafer metallization system will soon go on sale.
A high-speed single-wafer ASD1 system called the Triase+ EX-II Pro can deposit films made of titanium nitride (TiN) and titanium silicon nitride (TiSiN). The soon-to-be-released Triase+ EX-II Pro has been created to meet the technological requirements of advanced devices that feature increasingly complex structures and multilayered design, building on the existing Triase+ EX-II TiN series that have been used in the interconnect and electrode metallization processes for memory and logic devices.
Numerous benefits come with the Triase+ EX-II Pro, such as outstanding step coverage for high aspect ratio structures, continuity of ultra-thin films, consistency of film thickness, increased productivity over earlier models, and process compliance with different temperature zones.
The Triase+ EX-II Pro has a gas delivery system that allows for high-volume gas flow with high purge efficiency2 as well as a heat controlling system to support these capabilities. Existing customers can upgrade to the most recent hardware at a lower cost by retrofitting earlier models with these new features.
According to, Vice President & General Manager, TFF BU at TEL, “The Triase+ EX-II Pro delivers a technology solution that meets the latest device scaling needs. They will keep responding to even more difficult problems of the future by enhancing technology development and expanding their product line.
