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Last Updated: Apr 25, 2025 | Study Period: 2023-2030
The ratio of the mass of water vapour Mw to the volume V occupied by the mixture is known as the vapour concentration or absolute humidity. The well-known cloud formation and condensation processes are caused by vapour.
In order to prepare a liquid sample for gas chromatography, it is frequently used to carry out the physical operations of distillation and headspace extraction.A substance's concentration in the gaseous phase and the extent of evaporation increase as a function of a substance's vapour pressure.
The Global Vapor Concentration Controller Market accounted for $XX Billion in 2022 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2023 to 2030.
Engineering at the atomic scale was necessary for recent semiconductor processes. Mass Flow Controllers (MFCs) are capable of accurately controlling gases, but it is important to understand the vaporisation of liquid or solid precursors.
The fabrication yield is impacted by process variation brought on by unstable precursor delivery.Three different vaporising techniques are available from HORIBA: bubbling, baking, and direct injection.
There are benefits and drawbacks to each strategy. The bubbling method, among them, is frequently used for III-V MOCVD because it has a straightforward configuration and may be employed for processes under atmospheric pressure.
The space region is constantly in equilibrium with the precursor in the ideal bubbling situation, and the precursor temperature is under stable control. The proportion of the precursor molar flow rate to the overall flow rate, or C, is used to characterise the precursor concentration.
We can infer from the precursor molar flow rate equation, QP, that maintaining C constant is crucial for consistent precursor delivery.
Yet, there are a lot of things that make stabilising C challenging. For instance, the temperature of the carrier gas and the heat produced during vaporisation both have a direct impact on the bubbler temperature.
Precursor vapour pressure is also influenced by the quantity of remaining precursor. Precursor flow control and concentration control are the two main types of precursor delivery control systems.
The former is to change C by managing the total pressure, PT, so called "Pressure-based VCC" or by controlling a dilution ratio by utilising two MFCs, so called "Flow-based VCC".
Sl no | Topic |
1 | Market Segmentation |
2 | Scope of the report |
3 | Abbreviations |
4 | Research Methodology |
5 | Executive Summary |
6 | Introduction |
7 | Insights from Industry stakeholders |
8 | Cost breakdown of Product by sub-components and average profit margin |
9 | Disruptive innovation in the Industry |
10 | Technology trends in the Industry |
11 | Consumer trends in the industry |
12 | Recent Production Milestones |
13 | Component Manufacturing in US, EU and China |
14 | COVID-19 impact on overall market |
15 | COVID-19 impact on Production of components |
16 | COVID-19 impact on Point of sale |
17 | Market Segmentation, Dynamics and Forecast by Geography, 2023-2030 |
18 | Market Segmentation, Dynamics and Forecast by Product Type, 2023-2030 |
19 | Market Segmentation, Dynamics and Forecast by Application, 2023-2030 |
20 | Market Segmentation, Dynamics and Forecast by End use, 2023-2030 |
21 | Product installation rate by OEM, 2023 |
22 | Incline/Decline in Average B-2-B selling price in past 5 years |
23 | Competition from substitute products |
24 | Gross margin and average profitability of suppliers |
25 | New product development in past 12 months |
26 | M&A in past 12 months |
27 | Growth strategy of leading players |
28 | Market share of vendors, 2023 |
29 | Company Profiles |
30 | Unmet needs and opportunity for new suppliers |
31 | Conclusion |
32 | Appendix |