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The procedure of alignment is as follows: For starters, the rotation unit rotates wafers for one or more rounds. The optical sensor unit then detects the water’s edge information and calculates the central deviation and notch position before sending the data to the controller, which sends signals to the mechanical structure.
Wafer pre-aligner is crucial in wafer manufacturing. Wafer pre-aligner precisely places wafers before they are transferred to the exposure platform, and the positioning accuracy has a significant impact on wafer exposure accuracy and the whole manufacturing system’s efficiency.
The Global Wafer Aligner Market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
SUSS Micro Tec Introduces the New Mask Aligner MA12. SUSS Micro Tec, a global supplier of equipment and process solutions to the semiconductor industry and associated markets, has unveiled the Mask Aligner MA12 today.
This semi-automated instrument is intended for industrial research and manufacture of wafers up to 300 mm in diameter and 300×300 mm square substrates. It represents the most recent mask aligner technology in terms of accuracy, optical performance, and versatility.
The operator-assisted MA12 provides maximum process flexibility, including submicron alignment, and incorporates SUSS Micro Tec’s MO Exposure Optics, a unique illumination optics that can be adjusted to satisfy a variety of exposure requirements.
The newly released mask aligner is aimed at the Advanced Packaging market, which includes 3D wafer-level chip scale packaging (3D WLCSP) and wafer-level packaging (WLP), as well as the MEMS market.
The SUSS Micro Tec MA12 combines the benefits of a dependable manual tool specialized in the handling of delicate substrates, such as highly deformed wafers and fragile substrates, with the performance of a cutting-edge 300 mm lithography tool.
Processes established on the MA12 can be rapidly transferred to the automated SUSS Micro Tec high-volume production platform. The MA12 was created to allow for the rapid and successful development of new products and process technologies.
The expanded capabilities of the industry-compatible MA12 will aid research organizations by providing the flexibility required in the development and adoption of cutting-edge lithography methods.
