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An exceptionally low coefficient of thermal expansion (CTE) and extraordinary thermal stability are two characteristics of ultra-low expansion glass (ULE). The term CTE describes how much a material expands or contracts in response to temperature variations. ULE glass exhibits little dimensional change over a broad temperature range because it has a CTE that is near to zero.
ULE glass’ unusual qualities make it very sought-after for a variety of high-precision applications, particularly those that call for outstanding dimensional stability and little temperature change. ULE glass is perfect for situations where temperature changes could otherwise result in dimensional alterations because it can keep its shape and size even under considerable temperature shifts.
Commonly found in high-end camera lenses, interferometers, and precision optics such as astronomical observatories. Because of its low CTE, it keeps the optical components stable and in precise alignment despite changing environmental factors. ULE glass is used in photomasks and other crucial parts of the semiconductor industry.
Because of its durability, lithography techniques can be performed precisely, which is necessary to produce complex patterns on semiconductor wafers. ULE glass is used in aerospace and defense technology, including satellite and space telescope systems, where dimensional stability in harsh environments is essential.
It’s crucial to remember that ULE glass is a specialty product and is typically more expensive than ordinary glasses. ULE glass might become more widely available and find new uses in various industries as technology develops and production methods get better.
The Global Ultra low expansion glass market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
Titania-silicate glass ULE 7972 has near zero expansion properties, making it the material of choice for special applications such gratings, reference blocks for machine tools, interferometer reference mirrors, and telescope mirrors. The CTE of ULE glass, a single-phase, supercooled liquid, is extremely close to zero ppb/K.
The requirements for mask and optical substrates for EUVL applications have been met by EUV ULE 7973 glass. Stepper optics had to undergo a significant design change from refractive to reflecting when lithography moved from 193nm to 13.4nm.
Substrate materials in reflected optics should only be passive. The photomask and the optics’ multilayer coatings should reflect the incident light back without any mechanical or optical distortion introduced by the substrate underneath.
