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Gas supply systems are essential components of semiconductor fabrication plants when it comes to depositing thin films. The gases used in material deposition determine the quality of the created layers. A gas supply system provides an optimal and reliable supply of gases with a maximum degree of purity directly to the gas delivery point.
Such gas supply systems typically consist of a bulk gas supply connected to the raw gas tanks, gas distribution system, electronic mass flow controllers, system control, and safety equipment.
The gas distribution system is normally connected to the base gas tanks, and consists of pressure regulating and high purity cylinders.
The gas supply system is controlled and monitored by electronic mass flow controllers which maintain the gas flow rate and purity. Pressure regulators are used to reduce pressure from high-pressure cylinders to middle-pressure level required.
The system is made with several safety devices attached, such as a liquid nitrogen tank for cryogenic protection of gas sources, as well as bubble detectors and vacuum pumps for prevention of contamination in the gas supply system.
Temperature compensation systems are also used to minimize gas loss caused by heat variation. To ensure maximum gas purity and system accuracy, regular filter and regulator maintenance is necessary.
Overall, gas supply systems used in semiconductor manufacturing plants are complex systems which need to be monitored closely and maintained regularly for optimal working conditions.
The quality and purity of gases supplied to the fabrication process is crucial for the end product and this is precisely why reliable and user-friendly gas supply systems are needed. By using these systems, the quality of the material deposition processes is improved and yields are likewise increased.
The Global electronics material gas supply system market accounted for $XX Billion in 2023 and is anticipated to reach $XX Billion by 2030, registering a CAGR of XX% from 2024 to 2030.
After almost two years of development, the innovative carbon removal technology known as Hybrid Direct Air Capture (HDAC) is going online in Bakersfield, California, according to a statement released by Southern California Gas Company (SoCalGas). Avnos, Inc., a startup based in Los Angeles, is developing this technology.
As part of a pilot project, the company will show how the technology uses only electricity to generate water and remove carbon dioxide from the air. Additionally, SoCalGas and Avon’s, Inc. are working together on a larger pilot project that aims to show how this technology could be scaled up 1,000% from its current state. The hybrid Direct Air Capture (DAC) technology was developed at Pacific Northwest National Laboratory (PNNL) to simultaneously capture water and CO2 from the atmosphere.
After removing water vapor, the two-stage system draws CO2 from the dry air stream. The CO2 is then compressed for use, storage, or transportation, and the water vapor is condensed back into liquid for future use. Carbon management is an essential part of the toolkit that SoCalGas has been creating to support its overarching plan to achieve net-zero greenhouse gas emissions, along with other cleaner energy technologies like clean hydrogen and renewable natural gas.
